Influence of Chemical Structures on E-Beam Lithography Performance of Polysilsesquioxanes-Reference-Cited by-同舟云学术

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Influence of Chemical Structures on E-Beam Lithography Performance of Polysilsesquioxanes

Published:2024-09-12 Issue: Volume: Page:
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Miao Li¹,Zhang Ruisheng²,Lu Xinyu²,Wu Lianbin¹^ORCID,Wen Zaoxia¹,Qiu Huayu¹^ORCID,Wu Guang-Peng²^ORCID

Affiliation:

1. Key Laboratory of Organosilicon Chemistry and Material Technology, Ministry of Education, College of Material Chemistry and Chemical Engineering, Hangzhou Normal University, Hangzhou, Zhejiang 311121 ,China

2. Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310058, China

Funder

National Key Research and Development Program of China

National Science Fund for Distinguished Young Scholars

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.4c11916

Reference41 articles.

1. Extreme ultraviolet resist materials for sub-7 nm patterning

2. Review of recent advances in inorganic photoresists

3. 2D Bi2O2Se: An Emerging Material Platform for the Next-Generation Electronic Industry

4. Review on modeling and application of chemical mechanical polishing

5. Photovoltaic nanocells for high-performance large-scale-integrated organic phototransistors

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