Review of recent advances in inorganic photoresists-Reference-Cited by-同舟云学术

Review of recent advances in inorganic photoresists

Published:2020 Issue:14 Volume:10 Page:8385-8395
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Luo Chaoyun¹²³⁴,Xu Chanchan¹²³⁴,Lv Le¹²³⁴⁵,Li Hai⁶²³⁴,Huang Xiaoxi⁶²³⁴,Liu Wei⁶²³⁴^ORCID

Affiliation:

1. School of Applied Chemistry and Biological Technology

2. Shenzhen Polytechnic

3. Shenzhen

4. China

5. Postdoctoral Innovation Practice Base

6. Hoffmann Institute of Advanced Materials

Abstract

The current review aims to focus on recent progress and opportunities in inorganic photoresist materials, including their fabrication process, performance and working mechanism.

Funder

National Natural Science Foundation of China

Shenzhen Science and Technology Innovation Commission

Post-doctoral Foundation Project of Shenzhen Polytechnic

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2020/RA/C9RA08977B

Reference38 articles.

1. Advances in Patterning Materials for 193 nm Immersion Lithography

2. Lithographic Imaging Techniques for the Formation of Nanoscopic Features

3. Extreme ultraviolet resist materials for sub-7 nm patterning

4. Beyond EUV lithography: a comparative study of efficient photoresists' performance

5. Optical lithography—present and future challenges

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