Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale
Author:
Affiliation:
1. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973-5000, United States
Funder
Basic Energy Sciences
Publisher
American Chemical Society (ACS)
Subject
Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.nanolett.7b00514
Reference41 articles.
1. One-Dimensional Nanostructures: Synthesis, Characterization, and Applications
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3. On-Wire Lithography
4. Resolution Limits of Electron-Beam Lithography toward the Atomic Scale
5. In situ vaporization of very low molecular weight resists using 1/2 nm diameter electron beams
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