Can InAlN/GaN be an alternative to high power / high temperature AlGaN/GaN devices?
Author:
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx5/4154162/4139311/04154370.pdf?arnumber=4154370
Cited by 49 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Simulation-based optimization of barrier and spacer layers in InAlN/GaN HEMTs for improved 2DEG density;Micro and Nanostructures;2024-11
2. RF Performance Augmentation Using DG-InAlN/GaN HEMT;IEEE Transactions on Electron Devices;2024-09
3. Impact of AlN Buffer Layer Thickness on Electronic and Electrical Characteristics of In0.17Al0.83N/GaN High-Electron-Mobility Transistor;Physics of the Solid State;2024-06
4. Effect of High Temperature on the Performance of AlGaN/GaN T-Gate High-Electron Mobility Transistors With ~140-nm Gate Length;IEEE Transactions on Electron Devices;2024-03
5. Analysis of Trapping Effects on AlInN/GaN High Electron Mobility Transistors with Pulsed Electrical Measurements Under Visible and Infrared Illumination;physica status solidi (a);2024-01-15
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