Temporary bonding system with photopolymer release layer for 365nm UV debonding without laser
Author:
Affiliation:
1. Chinese Academy of Sciences,Shenzhen Institute of Advanced Electronic Materials Shenzhen Institute of Advanced Technology,Shenzhen,China,518055
2. Samcien Semiconductor Materials Co., Ltd.,Research and development department,Shenzhen,China,518055
Funder
National Natural Science Foundation of China
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9872527/9872536/09873370.pdf?arnumber=9873370
Reference6 articles.
1. Polyimide based temporary wafer bonding technology for high temperature compliant TSV backside processing and thin device handling
2. Thin Wafer Handling Challenges and Emerging Solutions
3. Thin Si wafer substrate bonding and de-bonding below 250 °C for the monolithic 3D integration
4. UV laser releasable temporary bonding materials for FO-WLP
5. Laser Debonding Enabling Ultra-Thin Fan-Out WLP Devices
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1. Temporary Bonding and Debonding in Advanced Packaging: Recent Progress and Applications;Electronics;2023-03-31
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