Universal PBTI Relaxation on the Negative VTH Shift in Oxide Semiconductor Transistors and New Insights
Author:
Affiliation:
1. Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai, China
2. Department of Nano/Micro-Electronics, Shanghai Jiao Tong University, Shanghai, China
3. Huawei Technologies Company Ltd., Shenzhen, China
Funder
National Key Research and Development Program of China
Shanghai Pilot Program for Basic Research-Shanghai Jiao Tong University
National Natural Science Foundation of China
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx7/55/10168002/10122685.pdf?arnumber=10122685
Reference18 articles.
1. New Insights into the Impact of Hydrogen Evolution on the Reliability of IGZO FETs: Experiment and Modeling
2. First demonstration of BEOL-compatible ultrathin atomic-layer-deposited InZnO transistors with GHz operation and record high bias-stress stability;zheng;IEDM Tech Dig,2022
3. Ubiquitous relaxation in BTI stressing—New evaluation and insights
4. Characterizing and Modelling of the BTI Reliability in IGZO-TFT using Light-assisted I-V Spectroscopy
5. Mobility–stability trade-off in oxide thin-film transistors
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Improvement of electrical characteristics and wet etching procedures for InGaTiO electrodes in organic light-emitting diodes through hydrogen doping;Journal of Alloys and Compounds;2024-06
2. The Role of Oxygen Vacancy and Hydrogen on the PBTI Reliability of ALD IGZO Transistors and Process Optimization;IEEE Transactions on Electron Devices;2024-05
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