Surface engineering for SiC etching with Ni electroplating masks
Author:
Affiliation:
1. Light,Nanomaterials & Nanotechnologies, CNRS EMR 7004,University of Technology of Troyes,Troyes,France,10004
Funder
French National Research Agency
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9933917/9933992/09934701.pdf?arnumber=9934701
Reference7 articles.
1. Direct electroless nickel plating on silicon surface;guanghui;Chinese Sci Bull,2004
2. Influence of the Masking Material and Geometry on the 4H-SiC RIE Etched Surface State
3. Electroless nickel deposition of a palladium-activated self-assembled monolayer on polyester fabric
4. Thin Films of (3-Aminopropyl)triethoxysilane on Aluminum Oxide and Gold Substrates
5. Deep SiC etching with RIE
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