On The Contribution of Secondary Holes in Hot-Carrier Degradation – a Compact Physics Modeling Perspective
Author:
Affiliation:
1. imec, Kapeldreef 75,Leuven,Belgium,3001
2. Ioffe Physical-Technical Institute,St.-Petersburg,Russia,194021
3. Institute of Microelectronics, Peking University,Beijing,China,100871
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10102927/10102928/10103111.pdf?arnumber=10103111
Reference28 articles.
1. Hot‐electron induced passivation of silicon dangling bonds at the Si(111)/SiO2 interface
2. Dissociation kinetics of hydrogen-passivated (111) Si-SiO2interface defects
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