A 0.6 ㎛ Small Pixel for High Resolution CMOS Image Sensor with Full Well Capacity of 10,000e- by Dual Vertical Transfer Gate Technology
Author:
Affiliation:
1. Samsung Electronics Co., Ltd.,Yongin-City,Korea
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9830116/9830138/09830254.pdf?arnumber=9830254
Reference5 articles.
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
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4. A Thin-Film Pinned-Photodiode Imager Pixel with Fully Monolithic Fabrication and beyond 1Me- Full Well Capacity;Sensors;2023-10-29
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