A Critical Examination of the TCAD Modeling of Hot Carrier Degradation for LDMOS Transistors
Author:
Affiliation:
1. Purdue University,Elmore Family School of Electrical and Computer Engineering,West Lafayette,IN,United States,47906
2. Texas Instruments Inc.,Dallas,TX,United States,75243
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9764406/9764408/09764435.pdf?arnumber=9764435
Reference35 articles.
1. Effects of temperature and defects on breakdown lifetime of thin SiO/sub 2/ at very low voltages
2. An anode hole injection percolation model for oxide breakdown-the "doom's day" scenario revisited
3. Anode hole generation mechanisms
4. Temperature Dependence of the Threshold Voltage Shift Induced by Carrier Injection in Integrated STI-Based LDMOS Transistors
5. Role of anode hole injection and valence band hole tunneling on interface trap generation during hot carrier injection stress
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Total Ionizing Dose Hardness Analysis of Transistors in Radiation-Hardened 0.18μm BCD Technology;2023 5th International Conference on Radiation Effects of Electronic Devices (ICREED);2023-05-24
2. Re-Examination of Hot Carrier Degradation Mechanism in Ultra-Scaled nFinFETs;IEEE Electron Device Letters;2022-11
3. Correlated Effects of Radiation and Hot Carrier Degradation on the Performance of LDMOS Transistors;2022 IEEE International Reliability Physics Symposium (IRPS);2022-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3