Multipeak Coercive Electric-Field-Based Multilevel Cell Nonvolatile Memory With Antiferroelectric-Ferroelectric Field-Effect Transistors (FETs)
Author:
Affiliation:
1. Institute and Undergraduate Program of Electro-Optical Engineering, National Taiwan Normal University, Taipei, Taiwan
2. Nuvoton Technology Corporation, Hsinchu, Taiwan
3. Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, Taiwan
Funder
Ministry of Science and Technology (MOST), Taiwan
Taiwan Semiconductor Research Institute (TSRI) and Nano Facility Center
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Acoustics and Ultrasonics,Instrumentation
Link
http://xplorestaging.ieee.org/ielx7/58/9782472/09749253.pdf?arnumber=9749253
Reference40 articles.
1. A Study of Endurance Issues in HfO2-Based Ferroelectric Field Effect Transistors: Charge Trapping and Trap Generation
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4. Compromising Science by Ignorant Instrument Calibration—Need to Revisit Half a Century of Published XPS Data
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