Optimal Structure of Lanthanum-Doped Hafnium Oxide: First-Principle Modeling
Author:
Affiliation:
1. Novosibirsk State University Rzhanov Institute of Semiconductor,Physics of the Siberian Branch of the RAS,Novosibirsk,Russia
2. Rzhanov Institute of Semiconductor,Physics of the Siberian Branch of the RAS,Novosibirsk,Russia
Funder
Russian Science Foundation
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9855012/9854868/09855173.pdf?arnumber=9855173
Reference14 articles.
1. Dopants Promoting Ferroelectricity in Hafnia: Insights from a comprehensive Chemical Space Exploration
2. The atomic and electronic structure of Hf0.5Zr0.5O2 and Hf0.5Zr0.5O2:La films
3. Advanced capabilities for materials modelling with Quantum ESPRESSO
4. Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material
5. Structure, chemistry and luminescence properties of dielectric La Hf1-O films
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Impact of lanthanum doping on the electronic structure of oxygen vacancies in hafnium oxide;Computational Materials Science;2024-01
2. Oxygen Vacancies as Traps Responsible for La-Doped Hf0.5Zr0.5O2 Charge Transport;The Journal of Physical Chemistry C;2023-07-20
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