Lateral Grain Growth of Amorphous Silicon Films With Wide Thickness Range by Blue Laser Annealing and Application to High Performance Poly-Si TFTs-Reference-Cited by-同舟云学术

Lateral Grain Growth of Amorphous Silicon Films With Wide Thickness Range by Blue Laser Annealing and Application to High Performance Poly-Si TFTs

Published:2016-03 Issue:3 Volume:37 Page:291-294
ISSN:0741-3106
Container-title:IEEE Electron Device Letters
language:
Short-container-title:IEEE Electron Device Lett.

Author:

Jin Seonghyun,Choe Younwoo,Lee Suhui,Kim Tae-Woong,Mativenga Mallory,Jang Jin

Funder

Ministry of Trade, Industry and Energy/Korea Display Research Corporation through the Program for the Development of Future Devices Technology for Display Industry

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/55/7416262/7387733.pdf?arnumber=7387733

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