Investigation of the Constant Current Stress for Charge-to-breakdown Extraction in Commercial SiC Power MOSFETs
Author:
Affiliation:
1. The Ohio State University,Dept. of Electrical and Computer Engineering,Columbus,OH,USA,43210
2. Ford Motor Co,Dearborn,MI,USA,48126
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10382185/10382163/10382231.pdf?arnumber=10382231
Reference14 articles.
1. Overview of Silicon Carbide Power Devices;Choi;Fairchild Semiconductor,2016
2. A Comparison of Ion Implantation at Room Temperature and Heated Ion Implantation on the Body Diode Degradation of Commercial 3.3 kV 4H-SiC Power MOSFETs
3. Improved Inversion Channel Mobility in 4H-SiC MOSFETs on Si Face Utilizing Phosphorus-Doped Gate Oxide
4. Reliability of SiC MOS devices
5. Review and analysis of SiC MOSFETs’ ruggedness and reliability
Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Investigation of the Electron Trapping in Commercial Thick Silicon Dioxides Thermally Grown on 4H-SiC under the Constant Current Stress;2024 IEEE International Reliability Physics Symposium (IRPS);2024-04-14
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