Hot-Carrier Degradation in Power LDMOS: Drain Bias Dependence and Lifetime Evaluation
Author:
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx7/16/8501619/08458210.pdf?arnumber=8458210
Cited by 16 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. A novel MOSFET with lateral–vertical charge coupling for extremely low C gd;Semiconductor Science and Technology;2024-04-18
2. Characterization and Modeling of Hot Carrier Degradation Under Dynamic Operation Voltage;IEEE Transactions on Device and Materials Reliability;2024-03
3. DC to AC analysis of HC vs. BTI damage in N-EDMOS used in single photon avalanche diode cell;Microelectronics Reliability;2023-11
4. Abnormal Two-Stage Degradation Under Hot Carrier Injection With Lateral Double-Diffused MOS With 0.13-μm Bipolar-CMOS-DMOS Technology;IEEE Transactions on Electron Devices;2023-07
5. Impact Analysis of Off-State Avalanche-Breakdown Stress on 650 V-Class Superjunction MOSFET;IEEE Transactions on Electron Devices;2023-07
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