Theoretical and Empirical Insight into Dopant, Mobility and Defect States in W Doped Amorphous In2 O3 for High-Performance Enhancement Mode BEOL Transistors
Author:
Affiliation:
1. University of Texas at Dallas,Department of Materials Science and Engineering,Richardson,TX,USA,75080
2. University of Notre Dame,Department of Electrical Engineering,Notre Dame,IN,USA,46556
Funder
Semiconductor Research Corporation
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10019319/10019320/10019366.pdf?arnumber=10019366
Reference23 articles.
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
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2. Design Guidelines for Oxide Semiconductor Gain Cell Memory on a Logic Platform;IEEE Transactions on Electron Devices;2024-05
3. Atomic Layer Deposition of WO3-Doped In2O3 for Reliable and Scalable BEOL-Compatible Transistors;Nano Letters;2024-04-30
4. Effect of Oxygen Treatment on the Electrical Performance and Reliability of IWO Thin-Film Transistors;IEEE Transactions on Nanotechnology;2024
5. High-Stability IWO Thin-Film Transistors Under Microwave Annealing for Low Thermal Budget Application;IEEE Transactions on Nanotechnology;2024
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