MVSG GaN-HEMT Model: Approach to Simulate Fringing Field Capacitances, Gate Current De-biasing, and Charge Trapping Effects
Author:
Affiliation:
1. University of Waterloo,Department of Electrical and Computer Engineering
2. Texas Instruments Inc,Kilby Research Labs
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10051690/10051691/10051741.pdf?arnumber=10051741
Reference7 articles.
1. Study of RF-circuit linearity performance of GaN HEMT technology using the MVSG compact device model
2. Modeling gallium-nitride based high electron Mobility transistors: linking device physics to high voltage and high frequency circuit design;radhakrishna;Thesis Mas-sachusetts Institute of Technology,2016
3. AlGaN/GaN HEMTs-an overview of device operation and applications
4. Facilitation of GaN-Based RF- and HV-Circuit Designs Using MVS-GaN HEMT Compact Model
5. MIT Virtual Source GaN HEMT: MVSG Model Manual;radhakrishna;3 1 0 Massachusetts Institute of Technology,2022
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2. Comprehensive empirical modeling of ScAlN/AlGaN/GaN ferroelectric HEMT;Semiconductor Science and Technology;2024-06-06
3. Fermi-Level Pinning Effect in Gate Region: A Case Study of Multimetal Gated AlGaN/GaN HEMT for High RF Linearity;2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM);2024-03-03
4. A New Vision of the Role Played by Buffer Dopants on the Operation of AlGaN/GaN HEMTs;2023 International Workshop on Integrated Nonlinear Microwave and Millimetre-Wave Circuits (INMMIC);2023-11-08
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