Device Performance Improvement of PMOS Devices Fabricated by $\hbox{B}_{2}\hbox{H}_{6}$ PIII/PLAD Processing-Reference-Cited by-同舟云学术

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Device Performance Improvement of PMOS Devices Fabricated by $\hbox{B}_{2}\hbox{H}_{6}$ PIII/PLAD Processing

Published:2007-09 Issue:9 Volume:54 Page:2497-2502
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Shu Qin ,McTeer A.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/16/4294178/04294237.pdf?arnumber=4294237

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