Comparison Between the Reaction Mechanisms of Nitridation of Si(100) by a NH3 Molecular Beam and by a $\rm{N}^+_2$ Ion Beam
Author:
Affiliation:
1. Research Institute for Scientific Measurements, Tohoku University, Katahira 2-1-1, Aobaku, Sendai 980-77, Japan
Abstract
Publisher
World Scientific Pub Co Pte Lt
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
https://www.worldscientific.com/doi/pdf/10.1142/S0218625X98000177
Reference6 articles.
1. Thermal nitridation of Si(100)-2 × 1 surface by NH3: XPS results
2. Thermally grownSi3N4thin films on Si(100): Surface and interfacial composition
3. Electronic structure of the nitride layers formed on a Si(111) surface: angle-resolved photoemission study
4. Photoemission studies of the reactions of ammonia and N atoms with Si(100)-(2×1) and Si(111)-(7×7) surfaces
5. Nitridation of a Si(100) surface by 100–1000 eV N+2 ion beams
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. XPS study of nitridation of diamond and graphite with a nitrogen ion beam;Surface Science;2001-10
2. Chemical Maps and SEM Images of the Reaction Products on Si Surfaces Irradiated with Cold and Hot C2H4 Beams;Atomic and Molecular Beams;2001
3. Nitridation of Si(100) surface with NH3;Applied Surface Science;1998-06
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