Growth of Micropipe Free Crystals on 4H-SiC {03-38} Seeds

Author:

Furusho Tomoaki1,Kobayashi Ryota2,Nishiguchi Taro1,Sasaki M.1,Hirai K.1,Hayashi Toshihiko1,Kinoshita Hiroyuki1,Shiomi Hiromu1

Affiliation:

1. Sixon Ltd.

2. Nagaoka University of Technology

Abstract

Growth of 4H-SiC bulk crystals on 4H-SiC {03-38} seeds was done. 4H-SiC {03-38} is obtained by inclining the c-plane toward <01-10> at a 54.7 degrees angle. Growth on the 4H-SiC {03-38} seed has the potential to achieve high quality crystals without micropipes and stacking faults. Micropipe-free c-plane 4H-SiC wafers were achieved by growth on the 4H-SiC {03-38} seed. A transmission X-ray topograph image of the micropipe free c-plane wafer revealed that there are no macroscopic defects with displacements.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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