Conductivity Modulated and Implantation-Free 4H-SiC Ultra-High-Voltage PiN Diodes

Author:

Salemi Arash1ORCID,Elahipanah Hossein1,Zetterling Carl Mikael1,Östling Mikael1

Affiliation:

1. KTH-Royal Institute of Technology

Abstract

Implantation-free mesa etched ultra-high-voltage 4H-SiC PiN diodes are fabricated, measured and analyzed by device simulation. The diode’s design allows a high breakdown voltage of about 19.3 kV according to simulations. No reverse breakdown is observed up to 13 kV with a very low leakage current of 0.1 μA. A forward voltage drop (VF) and differential on-resistance (Diff. Ron) of 9.1 V and 41.4 mΩ cm2are measured at 100 A/cm2, respectively, indicating the effect of conductivity modulation.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Performance Comparison of 6.5 kV SiC PiN Diode with 6.5 kV SiC JBS and Si Diodes;Materials Science Forum;2022-05-31

2. Effect of Ultraviolet Irradiation on 4H-SiC PiN Diodes Characteristics;Nanoscale Research Letters;2021-09-10

3. Influence and Suppression of Harmful Effects Due to By-Product in CVD Reactor for 4H-SiC Epitaxy;IEEE Transactions on Semiconductor Manufacturing;2021-08

4. Reduction of harmful effect due to by-product in CVD reactor for 4H-SiC epitaxy;2020 International Symposium on Semiconductor Manufacturing (ISSM);2020-12-15

5. Impact of precise temperature control for 4H-SiC epitaxy on large diameter wafers;2020 International Symposium on Semiconductor Manufacturing (ISSM);2020-12-15

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