Top-Seeded Solution Growth of 3 Inch Diameter 4H-SiC Bulk Crystal Using Metal Solvents

Author:

Kusunoki Kazuhiko1,Kamei Kazuhito1,Okada Nobuhiro1,Moriguchi Koji1,Kaido Hiroshi1,Daikoku Hironori2,Kado Motohisa2,Danno Katsunori2,Sakamoto Hidemitsu2,Bessho Takeshi2,Ujihara Toru3

Affiliation:

1. Waseda University

2. Toyota Motor Corporation

3. Nagoya University

Abstract

We performed top-seeded solution growth of 4H-SiC for obtaining longer length crystal. Si-Cr and Si-Ti melts were used as solvents. Meniscus formation technique was applied to the present study. Special attention was paid to improve the process stability during long-term growth. One of major technological problems in the solution growth is that the precipitation of polycrystalline SiC which hiders the stable single crystal growth. Another problem is the fluctuation of supersaturation at the growth interface during the growth. Through the optimization of growth process conditions, we have successfully grown 4H-SiC single crystals up to 14 mm long with three-inch-diameter, and evaluated their crystalline quality.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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