Study of Gettering Mechanisms in Silicon: Competitive Gettering between Phosphorus Diffusion Gettering and Other Gettering Sites

Author:

Shabani Mohammad B.1,Yamashita T.1,Morita E.1

Affiliation:

1. SUMCO Corporation

Abstract

The effectiveness of phosphorus diffusion gettering (PDG) and related segregation coefficients for different metal impurities were measured applying thermal treatments in the temperature range 800-950 °C for different times. We used multi-crystalline and mono-crystalline CZ p-type wafers with different boron concentrations and different levels of dislocations and bulk micro-defects (BMD). In all sample types, for Cu and Ni we found complete gettering in the temperature range investigated. In the case of Fe, the segregation coefficient increases with both increase in temperature and extension of time. The increase is qualitatively changing when going above 900 °C. At 950 °C the segregation coefficient increases faster at shorter diffusion time but at extended diffusion time it increases slower as compared to diffusion at 900 °C. At the same temperature and time of phosphorus diffusion the segregation coefficient is found to be independent of the metal impurity concentration in the range of 1012-1015 cm-3 investigated. We have shown that the presence of BMD and dislocations in bulk silicon does not impede the ability of PDG to completely remove Fe, Ni and Cu metal impurities from the bulk. Further analysis suggests that the PDG has the same gettering efficiency for mono-crystalline silicon and multi-crystalline silicon. We conclude that if any bulk precipitation of Fe, Ni and Cu impurities is present in multi-crystalline silicon it cannot seriously compete with PDG. However we found that increasing the boron concentration in the samples reduces the segregation coefficient of Fe, and this reduction is more severe at lower temperatures. Finally, by applying a post anneal ramp down from 900 °C to 700 °C after phosphorus diffusion, we found that the Fe segregation coefficient increases by a factor of 36 for lightly B doped samples, from 53 to 1919, leading to a significant reduction of Fe in the bulk after 2 hours ramp down anneal.

Publisher

Trans Tech Publications, Ltd.

Subject

Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics

Reference16 articles.

1. A. A. Istratov, H. Hieslmair, E. R. Weber, Appl. Phys. A 70, (2000), p.489.

2. M. B. Shabani, Y. Shiina and Y. Shimanuki, in High Purity Silicon, C. L Claeys P. Rai-Choudhury, The Electrochchem. Sco. Proceeding Series, Penninton, N. J 2000-17, p.305.

3. A. Bentzen, E. S. Marstein, R. Kopecek, and A. Holt, Proc. 19 th IEEE PVSC (2004) p.935.

4. D. Macdonald, A Cuevas, A. Kinomura. Y. Nakano, L. J. Geerligs, J. Appl. Phys. 97 (2005).

5. A. Ourmazd and W. Schroter, Appl. Phys. Lett. 45 (7) (1984), p.781.

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3