Deep Energy Levels of Platinum-Hydrogen Complexes in Silicon

Author:

Badr Elie1,Pichler Peter2,Schmidt Gerhard3

Affiliation:

1. Fraunhofer Institute for Integrated Systems and Device Technology

2. Fraunhofer Institute of Integrated Systems and Device Technology (IISB)

3. Infineon Technologies Austria AG

Abstract

Hydrogen incorporated into the samples by wet chemical etching interacts with platinum and forms several energy levels in the silicon forbidden band gap. Deep-level transient spectroscopy (DLTS) on Schottky diodes reveals several platinum-hydrogen related levels in p- and n-type silicon. In the n-type silicon, two new platinum-hydrogen related levels at 0.28 and 0.41 eV below the conduction band are reported. Annealing at 377 °C results in the dissociation of their corresponding platinum-hydrogen complexes.

Publisher

Trans Tech Publications, Ltd.

Subject

Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Annealing of Pt‐H Defects in High‐Voltage Si p+/n− Diodes;physica status solidi (a);2019-07-05

2. Diffusion and trapping of implanted hydrogen in a Si/Si:B/Si structure;Materials Science in Semiconductor Processing;2017-08

3. Metastable Defects in Proton Implanted and Annealed Silicon;Solid State Phenomena;2015-10

4. Modeling the Post-Implantation Annealing of Platinum;Solid State Phenomena;2015-10

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