Impact of Stacking Fault on the I-V Characteristics of 4H-SiC Schottky Barrier Diode

Author:

Jung Hyun Jin1,Yun Seung Bok1,Kang In Ho1,Moon Jeong Hyun1,Kim Won Jeong2,Bahng Wook1

Affiliation:

1. Korea Electrotechnology Research Institute (KERI)

2. Changwon University

Abstract

The influence of stacking faults (SFs) and triangular defects (TDs) on the electrical properties of 4H-SiC Schottky barrier diode (SBD) were investigated. The SF types and locations were distinguished and mapped by using room-temperature photoluminescence (PL) and optical microscope. SBDs were fabricated including the location of SF’s and TD’s. The effects of the types of defects and its area portion in the fabricated SBDs were also investigated. Based on the present data, 3C-TD has more harmful effect rather than the other SFs. The fabricated SBDs including SFs showed that increase of area portion of SF’s also resulted increase of specific on resistance of SBDs.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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