Polytype Control in 6H-SiC Grown via Sublimation Method

Author:

Li Xian Xiang1,Jiang Shou Zhen1,Hu Xiao Bo1,Dong Jie1,Li Juan1,Chen Xiu Fang1,Wang Li1,Xu Xian Gang1,Jiang Min Hua1

Affiliation:

1. Shandong University

Abstract

6H-SiC ingots were grown with different growth interfaces at different rates via the sublimation method. A model for the step flow growth mechanism is proposed to interpret the occurrence of 15R-SiC inclusions in the 6H-SiC single crystal. The results show that the 15R-SiC occurs more easily on the convex and the concave interface than on the slight convex interface and 15R-SiC inclusion also occurs when the growth rate of 6H-SiC exceeds the critical rate of 300 %m/h with the slight convex interface at the seed temperature 2250°C.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference5 articles.

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. In-situ and ex-situ characterizations of PVT-grown 4H-SiC single crystals;Journal of Physics D: Applied Physics;2024-09-03

2. Polytype inclusions and polytype stability in silicon-carbide crystals;Semiconductors;2016-04

3. Observation of polytype stability in different-impurities-doped 6H–SiC crystals;Diamond and Related Materials;2011-04

4. Defect structure of 4H silicon carbide ingots;Journal of Crystal Growth;2011-03

5. Characterization of foreign grain on 6H-SiC facet;Journal of Central South University of Technology;2009-06

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