Abstract
6H-SiC ingots were grown with different growth interfaces at different rates via the
sublimation method. A model for the step flow growth mechanism is proposed to interpret the
occurrence of 15R-SiC inclusions in the 6H-SiC single crystal. The results show that the 15R-SiC
occurs more easily on the convex and the concave interface than on the slight convex interface and
15R-SiC inclusion also occurs when the growth rate of 6H-SiC exceeds the critical rate of 300 %m/h
with the slight convex interface at the seed temperature 2250°C.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference5 articles.
1. St. G. Muller, R. C. Glass, H. M. Hobgood, V. F. Tsvetkov, M. Brady, D. Henshall, J. R. Jenny, D. Malta, and C. H. Carter, Jr.: J. Crystal Growth, 211 (2000), p.325.
2. W. F. Knippenberg: Philips Res. Repts. 18 (1963), pp.161-274 (see p.262).
3. Han Rongjiang, The growth of large-diameter 6H-SiC single crystal and defects characterizations, Shandong University Doctoral Dissertation, 2004, p.61.
4. Z.G. Herro, B.M. Epelbaum, R. Weingartner, M. Bickermann, P. Masri, and A. Winnacker: J. Crystal Growth, 270 (2004), p.116.
5. P. Heuell, M.A. Kulakov, and B. Bullemer: Surface Science 331-333 (1995), p.965.
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