Application of ethyltrimethylammonium hydroxide (ETMAH) as an alternative developer solution/process for semiconductor lithography-Reference-Cited by-同舟云学术

Application of ethyltrimethylammonium hydroxide (ETMAH) as an alternative developer solution/process for semiconductor lithography

Published:2021-02-22 Issue:SC Volume:60 Page:SCCC01
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Santillan Julius Joseph,Harumoto Masahiko,Motono Tomohiro,dos Santos Andreia Figueiredo,Mori Chisayo,Tanaka Yuji,Stokes Harold,Asai Masaya,Itani Toshiro

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

https://iopscience.iop.org/article/10.35848/1347-4065/abe2e4/pdf

Reference42 articles.

1. 0.33 NA EUV systems for High Volume Manufacturing

2. High-NA EUV lithography exposure tool: advantages and program progress

3. Current challenges and opportunities for EUV lithography

4. Photo Material Readiness at the Eve of EUVL HVM

5. EUV resists: What's next?

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