Photo Material Readiness at the Eve of EUVL HVM-Reference-Cited by-同舟云学术

Photo Material Readiness at the Eve of EUVL HVM

Published:2017 Issue:5 Volume:30 Page:613-617
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

De Simone Danilo¹,Vanelderen Pieter¹,Vandenberghe Geert¹

Affiliation:

1. IMEC

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/30/5/30_613/_pdf

Reference4 articles.

1. 1. D. De Simone, M. Ming, M. Kocsis, P. De Schepper, F. Lazzarino, G. Vandenberghe, J. Stowers, S. Meyers, B. L. Clark, A. Grenville, V. Luong, F. Yamashita, and D. Parnell, Proc. SPIE, 9776 (2016) 97760B.

2. 2. D. De Simone, M. Ming, F. Lazzarino, and G. Vandenberghe, J. Photopolym. Sci. Technol., 29 (2016) 501.

3. 3. D. De Simone, Y. Vesters, A. Shehzad, G. Vandenberghe, P. Foubert, C. Beral, D. Van Den Heuvel, M. Mao, and F. Lazzarino, Proc. SPIE, 10143 (2017) 101430R1.

4. 4. W. Shibayama, S. Shigaki, S. Takeda, R. Onishi, M. Nakajima, and R. Sakamoto, Proc. SPIE, 9776 (2016) 977609.

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