Classification of dissolution modes of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions

Abstract

Abstract The development of high-numerical aperture exposure tools for EUV lithography is in progress. The development process (the dissolution of resist films) is the key to fine patterning. The dissolution dynamics of acidic polymers (the backbone polymers of chemically amplified resists) depend on various parameters related to molecular structures. In this study, the dissolution dynamics in tetraalkylammonium hydroxide (TAAH) aqueous solutions were classified into six classes on the basis of the frequency and impedance changes observed during the development process by a quartz crystal microbalance method. The relationship between class and physical parameters of materials was analyzed by decision tree and support vector machine methods. The feature values used were the alkyl chain length, molecular weight, and concentration of TAAH; the viscosity of the developer; and the protection ratio, molecular weight, contact angle, surface free energies of polymers, and film thickness. The classification accuracy was 0.80 for the validation data.