Abstract
Abstract
We propose a visualization technique for identifying an exfoliated monolayer hexagonal boron nitride (hBN) flake placed on a SiN
x
/Si substrate. The use of a Si substrate with a 63 nm thick SiN
x
film enhanced the contrast of monolayer hBN at wavelengths of 480 and 530 nm by up to 12% and −12%, respectively. The maximum contrast for the Si substrate with SiN
x
is more than four times as large as that for a Si substrate with a ∼90 or ∼300 nm SiO2 film. Based on the results of the reflectance spectrum measurement and numerical calculations, the enhancement is discussed.
Funder
Kansai Research Foundation
Chubei Itoh Foundation
Iketani Science and Technology Foundation
Hyogo Science and Technology Association
Japan Society for the Promotion of Science
Subject
General Physics and Astronomy,General Engineering
Cited by
4 articles.
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