Fast Electron Beam Lithography System with 1024 Beams Individually Controlled by Blanking Aperture Array-Reference-Cited by-同舟云学术

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Fast Electron Beam Lithography System with 1024 Beams Individually Controlled by Blanking Aperture Array

Published:1993-12-30 Issue:Part 1, No. 12B Volume:32 Page:6012-6017
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Yasuda Hiroshi,Arai Soichiro,Kai Jun-ichi,Ooae Yoshihisa,Abe Tomohiko,Takahashi Yasushi,Hueki Syunsuke,Maruyama Sigeru,Sago Satoru,Betsui Keiichi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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