1. eBeam Initiative Perceptions Survey Results;Fujimura,2017
2. Electron Beam Mask Writer EBM-9500 for Logic 7nm Node Generation;Matsui,2016
3. GPU-accelerated inline linearity correction: pixel-level dose correction (PLDC) for the MBM-1000;Zable,2017
4. Fast Electron Beam Lithography System with 1024 Beams Individually Controlled by Blanking Aperture Array
5. eMET: 50 keV electron multibeam mask exposure tool;Klikovis,2011