Multi-beam mask writer MBM-3000 for next generation EUV mask production-Reference-Cited by-同舟云学术

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Multi-beam mask writer MBM-3000 for next generation EUV mask production

Published:2024-04-09 Issue: Volume:60 Page:7
ISSN:
Container-title:Novel Patterning Technologies 2024
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Author:

Matsumoto Hiroshi,Yasuda Jumpei,Motosugi Tomoo,Kimura Hayato,Kojima Yoshinori,Yamashita Hiroshi,Saito Masato,Nakayamada Noriaki

Publisher

SPIE

Reference10 articles.

1. High-NA EUV lithography: current status and outlook for the future,;Levinson;Jpn. J. Appl. Phys,2022

2. Multi-beam mask writer, MBM-2000,;Matsumoto,2021

3. Recent progress and future of electron multi-beam mask writer

4. Fast Electron Beam Lithography System with 1024 Beams Individually Controlled by Blanking Aperture Array

5. eMET: 50 keV electron multibeam Mask Eexposure Tool,;Klein,2011

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