Plasma-Enhanced Atomic Layer Deposition of Ni-Reference-Cited by-同舟云学术

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Plasma-Enhanced Atomic Layer Deposition of Ni

Published:2010-05-20 Issue:5 Volume:49 Page:05FA11
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Lee Han-Bo-Ram,Bang Sung-Hwan,Kim Woo-Hee,Gu Gil Ho,Lee Young Kuk,Chung Taek-Mo,Kim Chang Gyoun,Park Chan Gyung,Kim Hyungjun

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference24 articles.

1. Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing

2. Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition

3. Plasma-Assisted Atomic Layer Deposition of Palladium

4. Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition

5. PEALD of a Ruthenium Adhesion Layer for Copper Interconnects

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1. Nickel thin films with bulk-like properties formed by the ion-beam sputtering – deposition cycles;Thin Solid Films;2024-08

2. Low temperature, area-selective atomic layer deposition of NiO and Ni;Journal of Vacuum Science & Technology A;2022-12

3. The effect of thickness and deposition angle on structural, chemical and magnetic properties of nickel slanted columns;Science of Sintering;2022

4. Thermal Chemistry of Nickel Diketonate Atomic Layer Deposition (ALD) Precursors on Tantalum and Silicon Oxide Surfaces;The Journal of Physical Chemistry C;2021-10-04

5. Atomic layer deposition of transition metal films and nanostructures for electronic and catalytic applications;Critical Reviews in Solid State and Materials Sciences;2020-09-20

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