Atomic layer deposition of transition metal films and nanostructures for electronic and catalytic applications-Reference-Cited by-同舟云学术

Atomic layer deposition of transition metal films and nanostructures for electronic and catalytic applications

Published:2020-09-20 Issue:5 Volume:46 Page:468-489
ISSN:1040-8436
Container-title:Critical Reviews in Solid State and Materials Sciences
language:en
Short-container-title:Critical Reviews in Solid State and Materials Sciences

Author:

Maina James W.¹,Merenda Andrea¹,Weber Matthieu²,Pringle Jennifer M.¹,Bechelany Mikhael²,Hyde Lachlan³^ORCID,Dumée Ludovic F.¹

Affiliation:

1. Geelong, Institute for Frontier Materials, Deakin University, Waurn Ponds, Victoria, Australia

2. Institut Européen des Membranes, IEM-UMR 5635 ENSCM, UM, CNRS, Université de Montpellier, Montpellier Cedex 5, France

3. Swinburne University of Technology, Victoria, Australia

Publisher

Informa UK Limited

Subject

Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Condensed Matter Physics,General Chemical Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10408436.2020.1819200

Reference92 articles.

1. A brief review of atomic layer deposition: from fundamentals to applications

2. Atomic Layer Deposition of Metal Sulfide Materials

3. ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition

4. Atomic layer deposition for biosensing applications

5. Surface passivation of high-efficiency silicon solar cells by atomic-layer-deposited Al2O3

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