Atomic Layer Deposition of Metal Sulfide Materials-Reference-Cited by-同舟云学术

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Atomic Layer Deposition of Metal Sulfide Materials

Published:2015-01-12 Issue:2 Volume:48 Page:341-348
ISSN:0001-4842
Container-title:Accounts of Chemical Research
language:en
Short-container-title:Acc. Chem. Res.

Author:

Dasgupta Neil P.¹,Meng Xiangbo²,Elam Jeffrey W.²,Martinson Alex B. F.³

Affiliation:

1. Department of Mechanical Engineering, University of Michigan, Ann Arbor, Michigan 41809, United States

2. Energy Systems Division, Argonne National Laboratory, Argonne, Illinois 60439, United States

3. Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, United States

Funder

Basic Energy Sciences

Publisher

American Chemical Society (ACS)

Subject

General Medicine,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ar500360d

Reference60 articles.

1. Atomic Layer Deposition: An Overview

2. Atomic Layer Epitaxy

3. Design of an atomic layer deposition reactor for hydrogen sulfide compatibility

4. Atomic layer epitaxy

5. Suntola, T.; Antson, J.Method for producing compound thin films. U.S. Patent 4,058,430, 1977.

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