High Temperature Operation of Boron-Implanted Diamond Field-Effect Transistors
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference11 articles.
1. High Carrier Mobility in Single-Crystal Plasma-Deposited Diamond
2. Diamond FET using high-quality polycrystalline diamond with f/sub T/ of 45 GHz and f/sub max/ of 120 GHz
3. 2 W∕mm output power density at 1 GHz for diamond FETs
4. High-temperature, high-voltage operation of pulse-doped diamond MESFET
5. Diamond devices and electrical properties
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1. Oxidized-Silicon-Terminated Diamond p-FETs With SiO2-Filling Shallow Trench Isolation Structures;IEEE Electron Device Letters;2023-11
2. The improvement of Schottky barrier diodes fabricated only by B ion implantation doping accomplished by refinement of the electrode structure;Japanese Journal of Applied Physics;2023-04-01
3. High breakdown voltage of boron-doped diamond metal semiconductor field effect transistor grown on freestanding heteroepitaxial diamond substrate;Diamond and Related Materials;2022-01
4. B-doped diamond field-effect transistor with ferroelectric vinylidene fluoride–trifluoroethylene gate insulator;Japanese Journal of Applied Physics;2017-09-15
5. High voltage breakdown (1.8 kV) of hydrogenated black diamond field effect transistor;Applied Physics Letters;2016-11-14
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