Investigation of Thermal Stability of TiN Film Formed by Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium Precursor for Metal-Gate Metal–Oxide–Semiconductor Field-Effect Transistor-Reference-Cited by-同舟云学术

Investigation of Thermal Stability of TiN Film Formed by Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium Precursor for Metal-Gate Metal–Oxide–Semiconductor Field-Effect Transistor

Published:2010-04-20 Issue:4 Volume:49 Page:04DA16
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Hayashida Tetsuro,Endo Kazuhiko,Liu Yongxun,Kamei Takahiro,Matsukawa Takashi,O'uchi Shin-ichi,Sakamoto Kunihiro,Tsukada Junichi,Ishikawa Yuki,Yamauchi Hiromi,Ogura Atsushi,Masahara Meishoku

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference19 articles.

1. Nitrogen Gas Flow Ratio and Rapid Thermal Annealing Temperature Dependences of Sputtered Titanium Nitride Gate Work Function and Their Effect on Device Characteristics

2. Growth mechanism and continuity of atomic layer deposited TiN films on thermal SiO2

3. Impact of atomic-layer-deposited TiN on the gate oxide quality of W/TiN/SiO2/Si metal–oxide–semiconductor structures

4. Surface Chemistry in the Atomic Layer Deposition of TiN Films from TiCl4 and Ammonia

5. Comparison Study for TiN Films Deposited from Different Method: Chemical Vapor Deposition and Atomic Layer Deposition

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2. Obtaining low resistivity (∼100 μΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor;Journal of Vacuum Science & Technology A;2018-09

3. Nonthermal Plasma Synthesis of Titanium Nitride Nanocrystals with Plasmon Resonances at Near-Infrared Wavelengths Relevant to Photothermal Therapy;ACS Applied Nano Materials;2018-06-07

4. Synthesis, structural and thermal characterisation of titanium silylamido complexes;Journal of Organometallic Chemistry;2014-12

5. Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition;ECS Journal of Solid State Science and Technology;2014