Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
Author:
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference33 articles.
1. Investigation of Thermal Stability of TiN Film Formed by Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium Precursor for Metal-Gate Metal–Oxide–Semiconductor Field-Effect Transistor
2. Tunable Work-Function Engineering of TiC–TiN Compound by Atomic Layer Deposition for Metal Gate Applications
3. Deposition of TiN and TaN by Remote Plasma ALD for Cu and Li Diffusion Barrier Applications
4. Voltage and current stress induced variations in TiN/HfSixOy/TiN MIM capacitors
5. FDSOI devices with thin BOX and ground plane integration for 32nm node and below
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