Obtaining low resistivity (∼100 μΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor-Reference-Cited by-同舟云学术

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Obtaining low resistivity (∼100 μΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor

Published:2018-09 Issue:5 Volume:36 Page:051505
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Krylov Igor¹²,Zoubenko Ekaterina²,Weinfeld Kamira³,Kauffmann Yaron²,Xu Xianbin²,Ritter Dan¹,Eizenberg Moshe²

Affiliation:

1. Department of Electrical Engineering, Technion—Israel Institute of Technology, Haifa 32000, Israel

2. Department of Materials Science and Engineering, Technion—Israel Institute of Technology, Haifa 32000, Israel

3. Solid State Institute, Technion—Israel Institute of Technology, Haifa 32000, Israel

Funder

Ministry of Science, Technology and Space

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5035422

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasma-enhanced atomic layer deposition of titanium nitride for superconducting devices;Applied Physics Letters;2024-08-05

2. Optical properties of plasmonic titanium nitride thin films from ultraviolet to mid-infrared wavelengths deposited by pulsed-DC sputtering, thermal and plasma-enhanced atomic layer deposition;Optical Materials;2023-09

3. Thermal annealing of superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition;Journal of Applied Physics;2023-07-17

4. Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films;Wear;2023-06

5. Research and Application Progress of Conductive Films in Energy Storage Devices;Advanced Materials Technologies;2023-04-28

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