Extreme Ultraviolet Resist Fabricated Using Water Wheel-Like Cyclic Oligomer with Pendant Adamantyl Ester Groups

Author:

Seki Hiroyuki,Kudo Hiroto,Oizumi Hiroaki,Itani Toshiro,Nishikubo Tadatomi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Photoresists based on bisphenol A derivatives with tert-butyl ester groups for electron beam lithography;Journal of Photochemistry and Photobiology A: Chemistry;2023-03

2. Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography;ACS Omega;2022-08-12

3. Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties by means of Extreme Ultraviolet Irradiation;Journal of Photopolymer Science and Technology;2017

4. Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-07

5. Positive molecular resists;Materials and Processes for Next Generation Lithography;2016

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