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Positive molecular resists

Published:2016 Issue: Volume: Page:319-348
ISSN:1876-2778
Container-title:Materials and Processes for Next Generation Lithography
language:
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Author:

Argitis Panagiotis,Vidali Veroniki P.,Niakoula Dimitra

Publisher

Elsevier

Reference86 articles.

1. Semiconductor lithography;Moreau,1988

2. Materials and processes for Deep-UV lithography;Iwayanagi,1988

3. Photoreactive polymers;Reiser,1989

4. Organic resist materials;Willson,1993

5. Chemical amplification mechanisms for microlithography;Reichmanis;Chem Mater,1991

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results;Nanomaterials;2020-08-14

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