Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography-Reference-Cited by-同舟云学术

Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography

Published:2016-07 Issue:4 Volume:34 Page:041606
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Yamamoto Hiroki¹,Tagawa Seiichi¹,Kozawa Takahiro¹,Kudo Hiroto²,Okamoto Kazumasa³

Affiliation:

1. The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan

2. Department of Chemistry and Materials Engineering, Faculty of Chemistry, Materials and Bioengineering, Kansai University, 3-3-35, Yamate-cho, Suita, Osaka 564-8680, Japan

3. Division of Quantum Science and Engineering, Faculty of Engineering, Hokkaido University, Sapporo 060-8628, Japan

Funder

Ministry of Education, Culture, Sports, Science, and Technology (MEXT)

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4953068

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