AlGaN/GaN-on-Silicon Metal–Oxide–Semiconductor High-Electron-Mobility Transistor with Breakdown Voltage of 800 V and On-State Resistance of 3 m$\Omega$$\cdot$cm$^{2}$ Using a Complementary Metal–Oxide–Semiconductor Compatible Gold-Free Process
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/5/i=6/a=066501/pdf
Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Multi-channel nanowire devices for efficient power conversion;Nature Electronics;2021-03-25
2. Au-free recessed Ohmic contacts to AlGaN/GaN high electron mobility transistor: Study of etch chemistry and metal scheme;Journal of Vacuum Science & Technology B;2020-05
3. GaN-on-Si HEMTs for wireless base stations;Materials Science in Semiconductor Processing;2019-08
4. Metal/Semiconductor Barrier Properties of Non-Recessed Ti/Al/Ti and Ta/Al/Ta Ohmic Contacts on AlGaN/GaN Heterostructures;Energies;2019-07-10
5. Emerging trends in wide band gap semiconductors (SiC and GaN) technology for power devices;Microelectronic Engineering;2018-02
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