Author:
Yamaguchi Atsuko,Fukuda Hiroshi,Kawada Hiroki,Iizumi Takashi
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
30 articles.
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1. The improvement of measurement accuracy of SADP pitch walking issue;Metrology, Inspection, and Process Control for Microlithography XXXIV;2020-03-20
2. Linewidth and roughness measurement of SAOP by using FIB and Planer-TEM as reference metrology;Metrology, Inspection, and Process Control for Microlithography XXXIII;2019-03-26
3. Image quality enhancement of a CD-SEM image using conditional generative adversarial networks;Metrology, Inspection, and Process Control for Microlithography XXXIII;2019-03-26
4. Linewidth roughness of advanced semiconductor features using focused ion beam and planar-transmission electron microscope as reference metrology;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-09-08
5. Line-width roughness of advanced semiconductor features by using FIB and planar-TEM as reference metrology;Metrology, Inspection, and Process Control for Microlithography XXXII;2018-03-22