Linewidth and roughness measurement of SAOP by using FIB and Planer-TEM as reference metrology

Author:

Takamasu Kiyoshi,Takahashi Satoru,Kawada Hiroki,Ikota Masami,Decoster Stefan,Lazzarino Frederic,Lorusso Gian F.

Publisher

SPIE

Reference15 articles.

1. Novel CD-SEM calibration reference patterned by EB cell projection lithography;Nakayama,2005

2. Impact of Long-Period Line-Edge Roughness (LER) on Accuracy in Critical Dimension (CD) Measurement and New Guideline for CD Metrology

3. A simulation study of repeatability and bias in the CD-SEM;Villarrubia,2003

4. Development and characterisation of a new line width reference material

5. Bias-free measurement of LER/LWR with low damage by CD-SEM;Yamaguchi,2006

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. X-ray detection properties of Bi-loaded plastic scintillators synthesized via solvent evaporation;Radiation Measurements;2020-07

2. EUV photoresist reference metrology using TEM tomography;Metrology, Inspection, and Process Control for Microlithography XXXIV;2020-03-20

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