Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient-Reference-Cited by-同舟云学术

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Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient

Published:2012-06-20 Issue: Volume:51 Page:06FJ08
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Iyoshi Shuso,Okada Makoto,Katase Tetsuya,Tone Katsuhiko,Kobayashi Kei,Kaneko Shu,Haruyama Yuichi,Nakagawa Masaru,Hiroshima Hiroshi,Matsui Shinji

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Interfacial Interactions during Demolding in Nanoimprint Lithography;Micromachines;2021-03-24

2. Bubble-free patterning with low line edge roughness by ultraviolet nanoimprinting using trans-1,3,3,3-tetrafluoropropene condensable gas;Applied Physics Letters;2016-10-03

3. Bubble-free high-speed UV nanoimprint lithography using condensable gas with very low global warming potential;Japanese Journal of Applied Physics;2016-06-09

4. Ultraviolet Nanoimprint Lithography in the Mixture of Condensable Gases with Different Vapor Pressures;Journal of Photopolymer Science and Technology;2016

5. Innovative UV nanoimprint lithography using a condensable alternative chlorofluorocarbon atmosphere;Microelectronic Engineering;2015-02

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