Bubble-free patterning with low line edge roughness by ultraviolet nanoimprinting using trans-1,3,3,3-tetrafluoropropene condensable gas
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4963785
Reference21 articles.
1. Mold-assisted nanolithography: A process for reliable pattern replication
2. Step and flash imprint lithography: a new approach to high-resolution patterning
3. Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer
4. Nanoimprint lithography and future patterning for semiconductor devices
5. Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography
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1. Electrical evaluation of copper damascene interconnects based on nanoimprint lithography compared with ArF immersion lithography for back-end-of-line process;Japanese Journal of Applied Physics;2024-02-20
2. Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene;Journal of Photopolymer Science and Technology;2022-12-16
3. Selective dry etching of UV-nanoimprinted resin passivation masks for area selective atomic layer deposition of aluminum oxide;Journal of Vacuum Science & Technology B;2021-09
4. Suppression of resist pattern collapse by crosslinker in ultraviolet nanoimprinting involving sequential infiltration synthesis with trimethylaluminum;Journal of Vacuum Science & Technology B;2021-05
5. Adhesion improvement of photoresist: destruction mode analysis;Advances in Patterning Materials and Processes XXXVII;2020-03-23
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