Step and flash imprint lithography: a new approach to high-resolution patterning-Reference-Cited by-同舟云学术

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Step and flash imprint lithography: a new approach to high-resolution patterning

Published:1999-06-25 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Colburn Matthew,Johnson Stephen C.,Stewart Michael D.,Damle S.,Bailey Todd C.,Choi Bernard,Wedlake M.,Michaelson Timothy B.,Sreenivasan S. V.,Ekerdt John G.,Willson C. Grant

Publisher

SPIE

Cited by 643 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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