Magnetically Enhanced Dual Frequency Capacitively Coupled Plasma Source for Large-area Wafer Processing
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A comprehensive study on the electron cyclotron resonance effect in a weakly magnetized capacitively coupled RF plasma: experiment, simulation and modeling;Plasma Sources Science and Technology;2023-04-01
2. Improved Double-Probe Technique for Spatially Resolved Diagnosis of Dual-Frequency Capacitive Plasmas;Plasma Science and Technology;2013-06
3. A brief review of dual-frequency capacitively coupled discharges;Current Applied Physics;2011-09
4. Plasma-based processes and thin film equipment for nano-scale device fabrication;Journal of Materials Science;2010-10-29
5. Optimization of plasma density and radial uniformity of a point-cusp magnetic field applied capacitive plasma;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2000-05
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